Products
Nearfield Simulation of a metallic grating
Scatterometry Software
 
Signal matching for a photoresist L/S grating on BARC/Si at 70.6° incidence.
The measurements have been done by SenTech Instruments/ Berlin/ Germany.
Photolithography Simulation Software
Cross Section of a EUV-Mask with a defect beneath the multi-layer stack.
Modeled aerial image for the EUV mask of the previous picture with the lateral offset of the defect relative to the absorber as a parameter. | 
http://www.osires.biz/